193nm laser beam expander is a core optical component specifically designed for deep ultraviolet excimer laser systems, widely used in high-end lithography, semiconductor manufacturing, and cutting-edge scientific research. This series precisely matches the 193nm wavelength and employs the classic Galilean afocal optical design to effectively suppress aberrations, ensuring excellent collimation accuracy and wavefront quality of the output beam.

Key Advantages

These beam expanders are manufactured using deep UV-grade fused silica material, offering extremely high laser damage thresholds and excellent thermal stability. The optics feature specialized 193nm anti-reflective coatings, achieving ≥96% transmission while effectively resisting deep UV laser irradiation for extended operational life. The product line supports fixed magnification options from 1.5X to 50X, with maximum output apertures up to 150mm, accommodating diverse beam expansion requirements.

Technical Features

The expanders incorporate adjustable divergence angle design, allowing precise calibration for different laser characteristics. Output divergence is inversely proportional to magnification, with high-power models delivering ultra-low divergence and long-range collimation transmission. Standard mounting threads (M22×0.75 or M40×1) facilitate rapid integration into existing laser systems.

Applications

193nm DUV laser beam expanders play a critical role in microelectronics manufacturing, semiconductor device lithography, biomedical research, and nano-fabrication, particularly in scientific experiments and industrial processes demanding ultra-high-precision beam control